Anthony Dunne & Fiona Raby, Park Interactives, 2000
Kritisches Design in Belgien, Ausstellung vom 4. März bis 3. Juni: “For the exhibition Designing Critical Design, Z33 invited Jurgen Bey (NL), Anthony Dunne & Fiona Raby (UK) en Marti Guixe (E), four designers who are all known for their critical attitude towards mainstream product design. They have distanced themselves from the modern commercial design world, but nevertheless use the mechanisms of that world to ask questions about their own discipline and about technology, social and ethical questions. Their ambivalent, critical position in respect of product design and the humorous language of forms that they use are the common threads running through this exhibition.” Via: e-Flux
